کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
196264 459836 2005 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Evaluation of initial deposition rate of electroless Ni–P layers by QCM method
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
Evaluation of initial deposition rate of electroless Ni–P layers by QCM method
چکیده انگلیسی

Electroless nickel–phosphorus (ENP) initial deposition rates from a glycine bath were studied by means of the quartz crystal microbalance (QCM) method. SEM and EDX methods were also used to study the morphology and elemental analysis of deposits. The effect of pH, temperature and the type of activation process on the initial deposition rate, surface morphology and surface elemental analysis of deposits were evaluated. Increasing the pH and the temperature cause an increase in deposition rate and a decrease in P content of deposits. The phosphorus content of obtained deposits in pre-plate method was greater than in sensitizer–activator process under the same conditions of the alloy deposition. The surface morphology depends on P content of deposits. By decreasing the P content of deposits, the grain size increases.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochimica Acta - Volume 50, Issue 28, 30 September 2005, Pages 5526–5532
نویسندگان
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