Application of soft X-ray reflectometry for analysis of underlayer influence on structure of atomic-layer deposited SrTixOy films

- Density of SrTiO3 films depends on underlayer material in SrTiO3/B/Si-ALD systems.
- Interface is very abrupt for the sample prepared on Si3N4 underlayer.
- HfO2 underlayer leads to formation of wide interface.
- SXRR emerges as a tool of atomic analysis at sub-nanometer scale.