کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
541375 | 871463 | 2011 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Carrier transport mechanism in La-incorporated high-k dielectric/metal gate stack MOSFETs
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
In this paper, carrier transport mechanism of MOSFETs with HfLaSiON was analyzed. It was shown that gate current is consisted of Schottky emission, Frenkel–Poole (F–P) emission and Fowler–Nordheim (F–N) tunneling components. Schottky barrier height is calculated to be 0.829 eV from Schottky emission model. Fowler–Nordheim tunneling barrier height was 0.941 eV at high electric field regions and the trap energy level extracted using Frenkel–Poole emission model was 0.907 eV. From the deviation of weak temperature dependence for gate leakage current at low electric field region, TAT mechanism is also considered.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 88, Issue 12, December 2011, Pages 3399–3403
Journal: Microelectronic Engineering - Volume 88, Issue 12, December 2011, Pages 3399–3403
نویسندگان
Hyuk-Min Kwon, Won-Ho Choi, In-Shik Han, Min-Ki Na, Sang-Uk Park, Jung-Deuk Bok, Chang-Yong Kang, Byoung-Hun Lee, Raj Jammy, Hi-Deok Lee,