کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
543684 1450396 2008 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Thermal conductivity measurements of low-k films using thermoreflectance phenomenon
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Thermal conductivity measurements of low-k films using thermoreflectance phenomenon
چکیده انگلیسی

The thermal conductivity of low-dielectric-constant (low-k) materials has been studied by a nano second thermoreflectance measurement system (Nano-TheMS). The Nano-TheMS, which utilizes thermoreflectance, can easily measure the thermal conductivity of thin film of nano-meter scale thickness. We have measured a series of low-k film samples with varying methyl group content. The methyl group content is a significant factor in determining the dielectric constant and mechanical strength of low-k materials. We have also measured the temperature dependence of the thermal conductivity from room temperature to 300 °C as this dependence is essential to simulate realistic temperature distributions inside integrated devices. It was found that its dependence is not remarkable but the thermal conductivity gradually increase with rising temperature.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 85, Issues 5–6, May–June 2008, Pages 796–799
نویسندگان
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