کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
6943588 1450349 2015 10 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Low-power-consumption fully depleted silicon-on-insulator technology
ترجمه فارسی عنوان
فن آوری سیلیکون بر روی عایق کاملا از بین می رود
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
چکیده انگلیسی
Scaling the CMOS device has continuously improved its functionality and performance while lowering its power consumption and price. However, the current “scaled CMOS” technology faces several problems regarding power consumption, and a migration to new transistor structures is proceeding. “Fully depleted silicon on insulator” (FDSOI) technology can lower power consumption and improve performance of CMOS circuits with a capability of low-voltage operation. This article reviews advances in FDSOI technology: device structure, back-bias control function, fabrication process, demonstration of small variability of transistors, reliability including soft error, low voltage circuit design and silicon verification, and improvement in the energy efficiency of CMOS logic circuits. The strong requirement of further improvement in energy in the near future is finally pointed out.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 132, 25 January 2015, Pages 226-235
نویسندگان
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