Ge diffusion and bonding state change in metal/high-k/Ge gate stacks and its impact on electrical properties

Ge diffusion and bonding state change in metal/high-k/Ge gate stacks and its impact on electrical properties

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 109, September 2013, Pages 137-141

Takuji Hosoi, Iori Hideshima, Ryohei Tanaka, Yuya Minoura, Akitaka Yoshigoe, Yuden Teraoka, Takayoshi Shimura, Heiji Watanabe,