Bimodal CAFM TDDB distributions in polycrystalline HfO2 gate stacks: The role of the interfacial layer and grain boundaries

Bimodal CAFM TDDB distributions in polycrystalline HfO2 gate stacks: The role of the interfacial layer and grain boundaries

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 109, September 2013, Pages 129-132

V. Iglesias, J. Martin-Martinez, M. Porti, R. Rodriguez, M. Nafria, X. Aymerich, T. Erlbacher, M. Rommel, K. Murakami, A.J. Bauer, L. Frey, G. Bersuker,