Highly inorganic titania based sol-gel as directly patternable resist for micro- and nano- structured surfaces

► Titania sol-gel films up to 1 μm micro- and nano- imprinted at low pressure (<40 MPa). ► Imprinted structures transformed in inorganic TiO2 (TiO2 > 90% w/w) by UV curing. ► High refractive index of the structures up to 2.4 at 300 nm after UV. ► Crack-free 510 nm structures depth.