Effect of hydrogen plasma on growth of Ir thin film by plasma-enhanced hybrid atomic layer deposition

► Growth behaviors of Ir films using hybrid ALD were investigated. ► The 3.2 nm thick Ir film was grown by hybrid ALD under 50 deposition cycles. ► The grown Ir layer exhibited typical self-limited nature of ALD. ► High conformality of 0.88 is achieved on 32 nm wide nano trench.