کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
729226 1461416 2015 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
The origin of forward bias capacitance peak and voltage dependent behaviour of gold/p-type indium phosphide Schottky barrier diode fabricated by photolithography
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
The origin of forward bias capacitance peak and voltage dependent behaviour of gold/p-type indium phosphide Schottky barrier diode fabricated by photolithography
چکیده انگلیسی

The admittance measurements which include the capacitance–voltage (C–V) and conductance–voltage (G/ω–V) characteristics of gold/p-type indium phosphide (Au/p-InP) Schottky barrier diodes (SBDs) were conducted by taking into account the interface states (Nss) and series resistance (Rs) effects in the temperature range of 80–320 K with a steps of 20 K. Experimental results confirm that the Nss and Rs are important parameters which strongly influence the main electrical parameters of SBD. The C–V plots for each temperature exhibit the increasing behaviour in depletion region and then give an anomalous peak such that peak position shifts toward positive bias region with increasing temperature due to the re-structuring and re-ordering of surface charge under the temperature effect and the existence of a series resistance (Rs). In addition, C takes negative values in the inversion region at edge, which is known as negative capacitance (NC) behaviour. The effect of Rs on the C–V plot is found considerably high at low temperatures in the accumulation region. Therefore, both the measured capacitance (Cm) and conductance (Gm/ω) were corrected to obtain the real diode capacitance (Cc) and conductance (Gc/ω). In addition, Rs and Nss values decrease with increasing temperature. Such behaviour of Rs and Nss can be attributed to the trap charges which have sufficient energy to escape from the traps located at gold/p-type indium phosphide (Au/p-InP) interface.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 30, February 2015, Pages 393–399
نویسندگان
, , ,