کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
729385 | 892890 | 2006 | 4 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Chemical compositions and optical properties of HfOxNy thin films at different substrate temperatures Chemical compositions and optical properties of HfOxNy thin films at different substrate temperatures](/preview/png/729385.png)
High-k HfOxNy thin films have been grown by radio frequency (rf) reactive sputtering of metal Hf target in N2/Ar/O2 ambient at different substrate temperatures. The chemical compositions of the films have been investigated as a function of substrate temperature by X-ray photoelectron spectroscopy (XPS). XPS measurements showed that nitrogen concentration increases with an increase in substrate temperature. Room-temperature spectroscopic ellipsometry (SE) with photon energy 0.75–6.5 eV was used to investigate the optical properties of the films. SE results demonstrated that refractive index n increases with an increase in substrate temperature. Based on TL parameters which were obtained from the best fit results used in a simulation of the measured spectra, meanwhile, we conclude that the energy band gap (Eg) decreases with an increase in substrate temperature.
Journal: Materials Science in Semiconductor Processing - Volume 9, Issue 6, December 2006, Pages 876–879