Effects of the temperature and beam parameters on depth profiles in X-ray photoelectron spectrometry and secondary ion mass spectrometry under C60+-Ar+ cosputtering

Effects of the temperature and beam parameters on depth profiles in X-ray photoelectron spectrometry and secondary ion mass spectrometry under C60+-Ar+ cosputtering

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Analytica Chimica Acta - Volume 852, 10 December 2014, Pages 129-136

Hua-Yang Liao, Meng-Hung Tsai, Wei-Lun Kao, Ding-Yuan Kuo, Jing-Jong Shyue,