کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8150689 | 1524425 | 2014 | 19 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Structure of initial Ge nanoclusters at the edges of Si(1Â 1Â 1) steps with the front in the ãâ1Â â1Â 2ã direction
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Initial stages of the formation of Ge nanoclusters at the edges of steps in the case of the deviation of Si(1Â 1Â 1) surface in ãâ1Â â1Â 2ã direction were studied with the help of ultrahigh vacuum scanning tunneling microscopy under the quasi-equilibrium growth conditions. On the basis of the analysis of the surface images with atomic resolution, the sequence of structural changes at the edges of steps during the initial formation of Ge nanoclusters was established. The atomic model of the stable initial nanoclusters in the half of unit cell of increased size of the surface structure 9Ã9 was proposed. Features of the atomic structure affecting the transfer of adsorbed atoms across the step were discussed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 404, 15 October 2014, Pages 39-43
Journal: Journal of Crystal Growth - Volume 404, 15 October 2014, Pages 39-43
نویسندگان
S.A. Teys, K.N. Romanyuk, B.Z. Olshanetsky,