کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9670504 | 1450403 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Reproducible resistance switching characteristics of pulsed laserdeposited polycrystalline Nb2O5
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
We investigated the reproducible and memory resistance switching characteristics of pulsed-laser deposited thin polycrystalline Nb2O5 film for application to nonvolatile memory devices. Reproducible switching cycles were observed, and the resistance ratios of two distinct conduction states were approximately two orders of magnitude. Two resistance switching states were also obtained for pulse duration as much as 10 ns. The degradation of both resistance states at 125 °C, indicating memory characteristics, was expected within 8 percent for 10 years. We also investigated the temperature-dependent conduction mechanisms of the high resistance state and the low resistance state, and we discussed a plausible resistance switching mechanism.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 80, 17 June 2005, Pages 260-263
Journal: Microelectronic Engineering - Volume 80, 17 June 2005, Pages 260-263
نویسندگان
Hyunjun Sim, Dooho Choi, Dongsoo Lee, Musarrat Hasan, Chandan B. Samantaray, Hyunsang Hwang,