کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9829296 | 1524487 | 2005 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Characterisation of epitaxial TiO2 thin films grown on MgO(0Â 0Â 1) using atomic layer deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Characterisation of epitaxial TiO2 thin films grown on MgO(0Â 0Â 1) using atomic layer deposition Characterisation of epitaxial TiO2 thin films grown on MgO(0Â 0Â 1) using atomic layer deposition](/preview/png/9829296.png)
چکیده انگلیسی
Thin films of TiO2 have been deposited onto MgO(0 0 1) substrates using atomic layer deposition at 300 °C. Plan and cross-sectional transmission electron microscopy (TEM), X-ray diffraction and atomic force microscopy have been used to understand the nature of the films. X-ray and electron diffraction showed that a polycrystalline, epitaxial anatase film was produced. The c-axis of the anatase was parallel to the MgO(0 0 1) surface with two orientational variants at right angles to each other in the plane of the film, each aligned with an MgO cube axis. Plan-view and cross-sectional TEM showed that the grain structure of the film reflected this orientation relationship, with the grain morphology comprising two sets of roughly tetragonal grains. Also present was a small fraction of equiaxed, anatase grains which were randomly oriented. Roughness measurement using atomic force microscopy showed that the epitaxial anatase films were quite smooth, in comparison to equivalent non-aligned films grown on silicon.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 285, Issues 1â2, 15 November 2005, Pages 208-214
Journal: Journal of Crystal Growth - Volume 285, Issues 1â2, 15 November 2005, Pages 208-214
نویسندگان
D.R.G. Mitchell, D.J. Attard, G. Triani,