کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9830038 | 1524502 | 2005 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Growth mechanism of beam-induced lateral epitaxy on (0Â 0Â 1) GaAs substrate in molecular beam epitaxy
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The mechanism of GaAs beam-induced lateral epitaxy (BILE) on (0Â 0Â 1) GaAs substrate by molecular beam epitaxy (MBE) was investigated by systematically varying the crystal orientation of ridges on the surface. In the growth sequence of BILE, a certain number of facets were first formed on the growth front in connection with the crystal orientation of the ridges. These facets competed with each other as they grew. As a result, the formation of the dominant facet determined the main shape. The crystal orientation of the ridge largely affected the formation of facets and their development. The cross-sectional images of the grown layers observed by a scanning electron microscope (SEM) indicates that the facets formed in the following order from first to last: (1Â 1Â 1)A facets, (1Â 1Â 0) facets, (1Â 1Â 1)B facets, and (0Â 0Â 1) facets. During the growth, facet formation was largely controlled by the intersurface diffusion of adatoms, although shadowing effects also influenced the grown shapes.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 276, Issues 1â2, 15 March 2005, Pages 64-71
Journal: Journal of Crystal Growth - Volume 276, Issues 1â2, 15 March 2005, Pages 64-71
نویسندگان
S. Naritsuka, T. Suzuki, K. Saitoh, T. Maruyama, T. Nishinaga,