کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9837971 | 1525287 | 2005 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effects of sputtering pressure on compositions and structures of fresnoite thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
Fresnoite is a new ferroelectric mineral which has potential applications in acoustic wave devices and non-linear optical devices. In this paper, fresnoite thin films were fabricated by r.f. sputtering. The experiments indicated that the working pressure influences significantly on the composition and structure of the thin films. As the pressure decreases, the deficiency of Ba and the excess of Si in the thin films were controlled. A thin film with chemical stoichiometry was obtained at the pressure of 0.3Â Pa. Besides, the decrease of the pressure improved the crystallinity and orientation of the thin films. These improvements on the stoichiometry and microstructure of the fresnoite thin films are attributed to the increase of the mean free path and the impacting energy of ions at low working pressure.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Physica B: Condensed Matter - Volume 355, Issues 1â4, 31 January 2005, Pages 100-105
Journal: Physica B: Condensed Matter - Volume 355, Issues 1â4, 31 January 2005, Pages 100-105
نویسندگان
Mankang Zhu, Liying Liu, Yudong Hou, Hui Yan, J.B. Xu, Mingming Shao, Xiaoyang Chen,