Probing buried interfaces on Ge-based metal gate/high-k stacks by hard X-ray photoelectron spectroscopy
Keywords: 85.30.-Z; 85.30.De; 85.30.âz; 73.40.Qv; 79.60.âI; 79.60.Jv; 73.21.Ac; 72.15.Lh; 71.30.+h; HAXPES; CMOS devices; Ge-based metal gate/high-k stacks;