
Optimization of plasma parameters for high rate deposition of titanium nitride films as protective coating on bell-metal by reactive sputtering in cylindrical magnetron device
Keywords: پرتوی واکنش پذیر; 52.77.Dq; 52.80.Sm; Nano-structured titanium nitride thin film; Reactive sputtering; Cylindrical magnetron; Bell-metal; Anti-corrosive;