کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1676980 1518094 2006 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
A study on the effects of two reactive gases in the reactive sputtering process
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
A study on the effects of two reactive gases in the reactive sputtering process
چکیده انگلیسی
A mathematical model for reactive sputtering with multiple gases is established. Several non-dimensional parameters were identified with their physical significance and then the governing equations were cast in a non-dimensional form. For an illustration, a two-reactive gas system is used for study. Results show that the stability is characterized by the well-known hysteresis loop in the steady state solutions. Through parameter analysis, we found when the ion fluxes intensified, the range of hysteresis loops were enlarged and shifted to higher inflow rates. Moreover, when the chemical reactions dominate either on target or substrate, the steady state can be totally stable without hysteresis. Pumping speed also controls the process stability. At high pumping speed, excessive reactive gas is less likely to present in the chamber, leading to the extinction of hysteresis loops.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volumes 506–507, 26 May 2006, Pages 168-172
نویسندگان
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