کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10147665 | 1646496 | 2018 | 43 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of growth conditions on microstructure of sputtered precursor for CuIn1-xGaxSe2 (CIGS) absorber layer deposited on stainless steel substrates
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
In this paper, we report the effect of growth conditions on the properties of sputtered precursor thin films for CuIn1-xGaxSe2 (CIGS) absorber layers. Specifically, precursor films containing Cu, In, Ga, and Se were deposited via co-sputtering on flexible Mo-coated stainless steel substrates over a wide range of compositions and deposition conditions. The impact on precursor film phase, morphology, and elemental distribution was investigated as a function of precursor Se content, substrate temperature, target type (CIG/CIG vs. In/Cu3Ga), and Na content. Precursor films selenized at high temperature (>500â¯Â°C) to form stoichiometric CIGS and completed using a CdS n-type buffer layer and transparent conducting oxide window layers exhibited full-cell efficiencies as high as 11.5%.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 665, 1 November 2018, Pages 36-45
Journal: Thin Solid Films - Volume 665, 1 November 2018, Pages 36-45
نویسندگان
M. Behr, M. Sharma, S. Sprague, N. Shinkel, J. Kerbleski, C. Alvey, S. Rozeveld, T. Hasan, C. Wintland, M. Mushrush, A. Wall,