کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10669733 | 1008785 | 2014 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Microstructure and mechanical properties of physical vapor deposited Cu/W nanoscale multilayers: Influence of layer thickness and temperature
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Based on our previous knowledge on Cu/Nb nanoscale metallic multilayers (NMMs), Cu/W NMMs show a good potential for applications as heat skins in plasma experiments and armors, and it could be expected that the substitution of Nb by W would increase the strength, particularly at high temperatures. To check this hypothesis, Cu/W NMMs with individual layer thicknesses ranging between 5 and 30 nm were deposited by physical vapor deposition, and their mechanical properties were measured by nanoindentation. The results showed that, contrary to Cu/Nb NMMs, the hardness was independent of the layer thickness and decreased rapidly with temperature, especially above 200 °C. This behavior was attributed to the growth morphology of the W layers as well as the jagged Cu/W interface, both a consequence of the low W adatom mobility during deposition. Therefore, future efforts on the development of Cu/W multilayers should concentrate on optimization of the W deposition parameters via substrate heating and/or ion assisted deposition to increase the W adatom mobility during deposition.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 571, Part 2, 28 November 2014, Pages 275-282
Journal: Thin Solid Films - Volume 571, Part 2, 28 November 2014, Pages 275-282
نویسندگان
M.A. Monclús, M. Karlik, M. Callisti, E. Frutos, J. LLorca, T. Polcar, J.M. Molina-AldareguÃa,