Deposition of c-axis orientation aluminum nitride films on flexible polymer substrates by reactive direct-current magnetron sputtering

► Deposited highly c-axis oriented AlN films on polyimide substrates. ► Investigated the effects of deposition parameters on the structural of AlN films. ► Low pressure, optimized N2/Ar flow ratio and power benefit AlN (002) orientation. ► Al underlayer has a strong influence on the film crystallography.