Fluid-kinetics enhanced selective etching process of NiPt film by piranha chemistry in silicide formation for complementary metal oxide semiconductor fabrication

► Effective nickel platinum (NiPt) selective etching process by piranha chemistry ► Higher electrochemical potential promotes β-Pt oxide formation. ► Stronger fluid kinetic and rapid voltammetric cycle enhance Pt etching rate. ► 5% Pt, 120-200 Å NiPt and 10% Pt, 100-180 Å NiPt silicide conditions verified ► Wafer surface damage is reduced through shorter NiPt selective etch process cycle.