کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10670039 | 1008846 | 2012 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
CaCu3Ti4O12 thin film capacitors: Evidence of the presence of a Schottky type barrier at the bottom electrode
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
This study aims to distinguish between the contributions of bottom and top electrodes to the dielectric properties of CaCu3Ti4O12 (CCTO) based parallel plate thin film capacitors. For this purpose, Au, Pt, and La0.9Sr1.1NiO4 as electrode materials were compared. Epitaxial and polycrystalline CCTO films were pulsed laser deposited. The nature of electrodes played a major role in altering the dielectric characteristics of the thin films. Existence of one or two Schottky barriers at either or both of the CCTO/electrode interfaces was observed. A careful comparison of the electrical characteristics allowed us to discriminate between the interfaces hosting the Schottky barrier without assuming the conduction type. In return, this knowledge of the Schottky barrier location allowed us to unambiguously establish the carrier's nature. Results point toward n-type carriers in CCTO thin films, in contradiction with previous reports.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 520, Issue 7, 31 January 2012, Pages 2632-2638
Journal: Thin Solid Films - Volume 520, Issue 7, 31 January 2012, Pages 2632-2638
نویسندگان
Romain Bodeux, Monique Gervais, Jérôme Wolfman, Cécile Autret-Lambert, Guozhen Liu, François Gervais,