Microstructure of ZnO thin films produced by magnetron sputter oblique deposition

► Oblique angle deposition of ZnO thin films by magnetron sputtering. ► X-ray diffraction measurement of crystal size, density, orientation, and stress. ► When the deposition angle exceeds 40° grains grow at an angle to the substrate. ► Crystal orientation does not change with the oblique angle. ► 1.3 Pa Ar gas pressure was found to be the most optimum value.