Growth and characterization of ZnO and MgxZn1 − xO thin films by aerosol assisted chemical vapor deposition technique

►Design of aerosol assisted chemical vapor deposition (AACVD) system for oxide thin films. ►MgxZn1 − xO thin films have been deposited on glass substrate using AACVD system. ►MgxZn1 − xO thin films were polycrystalline and single phase up to x = 0.2. ►The films are optically transparent with low absorbance. ►Variation of lattice parameters of MgxZn1 − xO films follow Vegard's law up to x = 0.2.