Sputtering deposition and characterization of zirconium nitride and oxynitride films

► c-Zr3N4 and c-Zr2ON2 films were sputtered in water vapor and nitrogen atmosphere. ► Both materials request additional deposition energy to be synthesized. ► Water as oxygen source in N2 atmosphere enhance the energy involved in the process. ► The structural properties of both phases were assessed. ► Optical properties and chemical composition confirmed structural results.