کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
10670367 1008866 2011 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Generalized ellipsometry of artificially designed line width roughness
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Generalized ellipsometry of artificially designed line width roughness
چکیده انگلیسی
We use azimuthally resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line width roughness (LWR). We model the artificially perturbed grating using one- and two-dimensional rigorous coupled-wave methods in order to evaluate the sensitivity of the experimental spectrally resolved data, measured using a generalized ellipsometer, to the dimensional parameters of LWR. The sensitivity is investigated in the context of multiple conical mounting (azimuth angle) configurations, providing more information about the grating profile.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 519, Issue 9, 28 February 2011, Pages 2633-2636
نویسندگان
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