کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10670621 | 1008868 | 2011 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The influence of methane/argon plasma composition on the formation of the hydrogenated amorphous carbon films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The quality of the a-C:H films was particularly correlated with the mixed ratio of methane/argon plasma. For a constant supply of energy and flowing rate, the optical emission from Hα intensity linearly increased with the addition of methane in argon plasma, while that from intensities of radiation of diatmoic radicals (CHâand C2â) exponentially decreased. For the a-C:H films, the added methane in argon plasma tended to raise the quantity of hydrogenated carbon or sp3 C-H structure, which exponentially decreased the nano-hardness and friction coefficient of the films. In contrast, the electric resistance of the films enlarged dramatically with the increase of the methane content in argon plasma. It is therefore advantageous to balance the mechanical properties and electrical resistance of the a-C:H film by adjusting plasma composition in the course of the film-growing process.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 519, Issue 6, 3 January 2011, Pages 2049-2053
Journal: Thin Solid Films - Volume 519, Issue 6, 3 January 2011, Pages 2049-2053
نویسندگان
Hsin-Hung Chen, Jiunn-Der Liao, Chih-Chiang Weng, Jui-Fu Hsieh, Chia-Wei Chang, Chao-Hsien Lin, Ting-Pin Cho,