کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10670637 | 1008976 | 2005 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Comparative study of (Ba,Sr)TiO3 films prepared by electron cyclotron resonance plasma sputtering and metal-organic decomposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Comparative study of (Ba,Sr)TiO3 films prepared by electron cyclotron resonance plasma sputtering and metal-organic decomposition Comparative study of (Ba,Sr)TiO3 films prepared by electron cyclotron resonance plasma sputtering and metal-organic decomposition](/preview/png/10670637.png)
چکیده انگلیسی
(Ba,Sr)TiO3 films were prepared on Pt/Ti/SiO2/Si substrates by mirror-confinement-type electron cyclotron resonance (ECR) plasma sputtering as well as by metal-organic decomposition (MOD). The films prepared by ECR plasma sputtering were crystallized at lower temperatures with better crystallinity and a denser structure than those by MOD. As for dielectric constant, films prepared by ECR plasma sputtering exhibited a relatively high value over 500 at a low annealing temperature of 873 K, whereas films by MOD exhibited approximately 350. This is attributed to the better crystallinity and the denser structure of the films by ECR plasma sputtering. The leakage current density of the films was found to be similar in both processes.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 476, Issue 1, 1 April 2005, Pages 73-78
Journal: Thin Solid Films - Volume 476, Issue 1, 1 April 2005, Pages 73-78
نویسندگان
T. Matsumoto, A. Niino, K. Numata, H. Saito, S. Miyake,