کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10670705 | 1009006 | 2005 | 16 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Fundamental understanding and modeling of reactive sputtering processes
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
The purpose of this article is to explain how different parameters affect the reactive sputtering process. A simple model for the reactive sputtering process is described. Based on this model, it is possible to predict the processing behaviour for many different ways of carrying out this process. It is also possible to use the results of the modeling work to scale processes from laboratory size to large industrial processes. The focus will be to obtain as simple a model that will still quite correctly describe most experimental findings. Despite some quite crude approximations, we believe that the model presented satisfies this criterion.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 476, Issue 2, 8 April 2005, Pages 215-230
Journal: Thin Solid Films - Volume 476, Issue 2, 8 April 2005, Pages 215-230
نویسندگان
S. Berg, T. Nyberg,