کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
10671028 1009031 2005 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Co3O4 protective coatings prepared by Pulsed Injection Metal Organic Chemical Vapour Deposition
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Co3O4 protective coatings prepared by Pulsed Injection Metal Organic Chemical Vapour Deposition
چکیده انگلیسی
Cobalt oxide films were grown by Pulsed Injection Metal Organic Chemical Vapour Deposition (PI-MOCVD) using Co(acac)3 (acac=acetylacetonate) precursor dissolved in toluene. The structure, morphology and growth rate of the layers deposited on silicon substrates were studied as a function of deposition temperature. Pure Co3O4 spinel structure was found for deposition temperatures ranging from 360 to 540 °C. The optimum experimental parameters to prepare dense layers with a high growth rate were determined and used to prepare corrosion protective coatings for Fe-22Cr metallic interconnects, to be used in Intermediate Temperature Solid Oxide Fuel Cells.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 473, Issue 1, 1 February 2005, Pages 98-103
نویسندگان
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