Design of a novel triple reduced surface field LDMOS with partial linear variable doping n-type top layer

• A novel triple RESURF LDMOS with partial LVD N-top layer is proposed.
• A more uniform distribution of surface electric field is achieved.
• The optimized novel device obtains a BV of 847 V and a Ron,sp of 79 mΩ cm2.
• The novel triple RESURF LDMOS can achieve a highest FOM of 9.08 MW/cm2.

A novel triple reduced surface field (RESURF) lateral double-diffused metal oxide semiconductor field effect transistor (LDMOS) with partial linear variable doping (LVD) N-type top (N-top) layer is proposed in this paper. Compared with the conventional triple RESURF LDMOS, a partial LVD N-top layer is introduced in the surface of N-well, providing a low on-resistance conduction path and leading to an optimized surface electric field, which alleviates the inherent tradeoff between the breakdown voltage (BV) and specific on-resistance (Ron,sp). With the n-drift region length of 70 μm, the novel triple RESURF LDMOS obtains a high BV of 847 V and a low Ron,sp of 79 mΩ cm2 which are 76 V higher and 46 mΩ cm2 lower than those of the conventional triple RESURF LDMOS. Therefore, the novel triple RESURF LDMOS can greatly improve the tradeoff between BV and Ron,sp. Furthermore, compared with the other existing technologies in the high BV level, the novel triple RESURF LDMOS can achieve a highest figure of merit (FOM, defined as BV2/Ron,sp) of 9.08 MW/cm2 and the conventional RESURF silicon limits are broken.