کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1552827 1513221 2015 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Study the target effect on the structural, surface and optical properties of TiO2 thin film fabricated by RF sputtering method
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
Study the target effect on the structural, surface and optical properties of TiO2 thin film fabricated by RF sputtering method
چکیده انگلیسی


• TiO2 films deposited by RF sputtering.
• Ti or TiO2 target used.
• Ti target yields films with smaller crystallites and better transparency.

The effect of target (Ti metal target and TiO2 target) on Titanium Dioxide (TiO2) thin films grown on ITO coated glass substrate by RF magnetron sputtering has been investigated. A comparative study of both the films was done in respect of crystalline structure, surface morphology and optical properties by using X-ray diffractometer (XRD), Atomic Force Microscopy (AFM) studies and ellipsometric measurements. The XRD results confirmed the crystalline structure and indicated that the deposited films have the intensities of anatase phase. The surface morphology and roughness values indicated that the film using Ti metal target has a smoother surface and densely packed with grains as compared to films obtained using TiO2 target. A high transmission in the visible region, and direct band gap of 3.67 eV and 3.75 eV for films derived by using Ti metal and TiO2 target respectively and indirect bandgap of 3.39 eV for the films derived from both the targets (Ti metal and TiO2 target) were observed by the ellipsometric measurements.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Superlattices and Microstructures - Volume 80, April 2015, Pages 215–221
نویسندگان
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