کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1663841 | 1517995 | 2016 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Fabrication of TaOxNy thin films by reactive ion beam-assisted ac double magnetron sputtering for optical applications
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Fabrication of TaOxNy thin films by reactive ion beam-assisted ac double magnetron sputtering for optical applications Fabrication of TaOxNy thin films by reactive ion beam-assisted ac double magnetron sputtering for optical applications](/preview/png/1663841.png)
چکیده انگلیسی
Tantalum oxynitride (TaOxNy) thin films have been deposited by reactive ion beam-assisted ac double magnetron sputtering. Thin films deposited by this method are known to have high mechanical durability and adhesion. A controlled variation of the refractive index of these optical coatings has been achieved through a systematic control of the oxygen and nitrogen gases present in the chamber during the film deposition. This method offers a rapid and economical way of fabricating interference and gradient index coatings used in many optical applications. To show the potential of this deposition method, a Bragg mirror stack was made with twenty alternating layers of oxygen-rich (high x) and nitrogen-rich (high y) TaOxNy thin films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 615, 30 September 2016, Pages 351-357
Journal: Thin Solid Films - Volume 615, 30 September 2016, Pages 351-357
نویسندگان
Souleymane T. Bah, Cheikhou O.F. Ba, Marc D'Auteuil, P.V. Ashrit, Luca Sorelli, Réal Vallée,