کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1663985 | 1517998 | 2016 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Current conduction mechanisms through Au/SnO/n-type Si/In devices
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
• We made and investigated the Au/p-type SnO/n-Si/In Schottky diodes.
• The gate (substrate) injection is verified by Schottky (Poole–Frenkel) emission.
• The intermedia SnSixOy strongly affects the SnO/n-Si Schottky diode's properties.
Current conduction mechanisms through Au/SnO/n-type Si/In devices were investigated. The electrical characteristics suggest that the injection behavior is governed by Schottky (Poole–Frenkel) emission for gate (substrate) injection. This injection is strong correlated with the interfacial property of devices. The discrepancy of SnO permittivity extracted respectively from Schottky and Poole–Frenkel emissions is observed and owing to the formation of intermediate SnSixOy layer.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 611, 29 July 2016, Pages 1–5
Journal: Thin Solid Films - Volume 611, 29 July 2016, Pages 1–5
نویسندگان
Hou-Yen Tsao, Yu-Wu Wang,