Shape selective photoinduced electrochemical behavior of thin ZnO layers prepared by surfatron

Thin layers of ZnO were prepared by using a special modification of the plasma-enhanced chemical vapor deposition known as surfatron. This technique utilizes the principle of surface-wave discharge powered by microwave magnetron generator. Two types of substrate holder regimes (static and movable) were intentionally employed for the preparation of two types of surface morphologies. A series of ZnO films were yielded with thicknesses ranging from 60 nm to 1500 nm. The layers were analyzed by profilometry, scanning electron microscopy, X-ray diffraction, Raman spectroscopy, UV-light adsorption and by a number of electrochemical tests. All prepared samples were crystalline and possessing different surface morphologies. It was shown that the electrochemical response of the films was directly reflecting their surface morphology.