Ultrathin and stable Nickel films as transparent conductive electrodes

• Indium-free transparent conductors are proposed.
• Ultrathin Ni films are fabricated with a very fast process at room temperature.
• Films have conductivity values up to 1.8 × 104 S/cm.
• Ni ultrathin films are good candidates for UV and NIR optoelectronic applications.

Ultrathin stable transparent conductive nickel films were deposited on quartz substrates by radio frequency sputtering at room temperature. Such films showed visible transmittance up to 80% and conductivity up to 1.8 × 104 S/cm, further increased to 2,3 × 105 S/cm by incorporation of a micrometric silver grid. Atomic force microscopy and scanning electron microscopy revealed quite compact, smooth and low surface roughness films. Excellent film stability, ease, fast and low cost process fabrication make these films highly competitive compared to indium tin oxide alternative transparent conductors. Films were characterized regarding their morphological, optical and electrical properties.