کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1664579 1008763 2015 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Atomic layer deposition of Al2O3 and Al2O3/TiO2 barrier coatings to reduce the water vapour permeability of polyetheretherketone
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Atomic layer deposition of Al2O3 and Al2O3/TiO2 barrier coatings to reduce the water vapour permeability of polyetheretherketone
چکیده انگلیسی


• Atomic layer deposition of Al2O3/TiO2 coatings reduced water vapour permeability.
• Bilayer coatings reduced the permeability more than single layer coatings.
• Bilayer coatings displayed higher adhesion strength than the single layer coatings.
• Double-sided coatings performed better than single-sided coatings.
• Correlation was found between total thickness and reduced water vapour permeability.

We demonstrate significantly enhanced barrier properties of polyetheretherketone (PEEK) against water vapour penetration by depositing Al2O3 or Al2O3/TiO2 nanofilms grown by atomic layer deposition (ALD). Nanoindentation analysis revealed good adhesion strength of a bilayer Al2O3/TiO2 coating to PEEK, while the single layer Al2O3 coating displayed flaking and delamination. We identified three critical design parameters for achieving the optimum barrier properties of ALD Al2O3/TiO2 coatings on PEEK. These are a minimum total thickness dependent on the required water vapour transmission rate, the use of an Al2O3/TiO2 bilayer coating and the application of the coating to both sides of the PEEK film. Using these design parameters, we achieved a reduction in moisture permeability of PEEK of over two orders of magnitude while maintaining good adhesion strength of the polymer–thin film system.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 591, Part A, 30 September 2015, Pages 131–136
نویسندگان
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