High speed atmospheric plasma deposition of transparent ZnO thin films without post-deposition annealing

• Deposition of ZnO thin films (135 nm) by atmospheric pressure plasma jet
• Transparent ZnO thin films obtained without post-deposition annealing
• Under optimal conditions, a 6.9 nm·m− 2·s− 1 deposition rate is reached.

ZnO thin films are deposited by means of zinc nitrate dissolved in ethanol and nebulized in an afterglow of an alternative current discharge in air. Influence on coating composition, crystallinity and optical properties of some deposition parameters like scan speed is discussed. Under optimal conditions, a 6.9 nm·m− 2·s− 1 deposition rate is reached, leading to transparent ZnO thin films in a very short time without the need of post-deposition annealing.