Influence of the electrical power applied to the target on the optical and structural properties of ZrON films produced via RF magnetron sputtering in a reactive atmosphere

• We growth zirconium oxynitride films by RF magnetron sputtering in reactive atmosphere.
• We determine the influence of the electrical power applied at the target in optical and structural properties.
• We determine the crystallite size, grain size and roughness of the zirconium oxynitride films.
• We determine the optical parameters such refractive index of the zirconium oxynitride films through Swanepoel method.
• We calculated the absorption coefficient and optical band gap of the zirconium oxynitride films.

The influence of the variation of electrical power applied to the target on the morphology and optical properties of zirconium oxynitride - zirconium oxide (ZrON) films deposited via RF magnetron sputtering on common glass substrates in a reactive atmosphere of N2/O2, with a flow ratio ΦN2/ΦO2 of 1.25 was investigated. The crystallographic structure of the films was established through X-ray diffraction (XRD), the morphology was evaluated through scanning electron microscopy (SEM) and atomic force microscopy (AFM), and the optical behavior was evaluated through transmittance measurements. The XRD analysis showed that the films grew with mixed crystalline structures: monoclinic (ZrO2) and body-centered cubic (Zr2ON2). SEM analysis showed that the films grew with a homogeneous morphology, and AFM results established that as the electrical power applied to the target increased, there were changes in the grain size and the roughness of the films. The thickness, refractive index, and absorption coefficient of the films were calculated using the values of the transmittance through the Swanepoel method. Additionally, the energy band gap was determined via analysis of the free interference region.