کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1665353 1518036 2014 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Influence of deposition conditions and substrate morphology on the electrical properties of sputtered ZnO:Al grown on texture-etched glass
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Influence of deposition conditions and substrate morphology on the electrical properties of sputtered ZnO:Al grown on texture-etched glass
چکیده انگلیسی


• Growth of ZnO:Al on various texture-etched glass substrates
• Reduced influence of growth disturbances using optimized sputtering conditions
• Higher ZnO:Al charge carrier mobility on U-shaped than on V-shaped textures

The focus of this work is the growth of aluminum-doped zinc oxide (ZnO:Al) on texture-etched glass substrates. We investigated the influence of sputter parameters, pressure and temperature on the charge carrier mobility of ZnO:Al films grown on different substrate textures. An optimized sputtering process was developed which led to charge carrier mobilities on textured substrates that are close to those on flat substrates. Based on X-ray diffraction measurements, we qualitatively explain the effect of different sputtering conditions. Furthermore, the ZnO:Al charge carrier mobility was related to the substrate morphology. ZnO:Al films on U-shaped surface morphologies showed significantly higher charge carrier mobilities than those on V-shaped structures. ZnO:Al damp heat stability and etching behavior provided evidence that the number of ZnO:Al growth disturbances on textured substrates can be reduced by adequate substrate morphology and sputtering conditions.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 568, 1 October 2014, Pages 25–30
نویسندگان
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