کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1665490 1518046 2014 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Influence of thickness on the structural properties of radio-frequency and direct-current magnetron sputtered TiO2 anatase thin films
ترجمه فارسی عنوان
تأثیر ضخامت بر خواص ساختاری فیلم های نازک تیتانیوم آناتاز اسپکترومغناطیس رادیویی و مستقیم جریان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی


• Anatase films without the presence of rutile were grown on unheated substrates.
• Radio-frequency sputtered films are crystalline as-deposited.
• Direct-current sputtered films become crystalline only after annealing at 500 °C.
• The crystallite size approaches zero when the film thickness approaches 25 nm.
• There is an expansive strain in the crystallites along the c-axis.

Thin films of TiO2 were deposited by reactive sputtering of a Ti target on unheated substrates and post-heated at 300 °C and 500 °C. They exhibit a granular structure. Direct current-sputtered films are amorphous as-deposited and crystallize (to pure anatase) only at 500 °C. Radio-frequency (rf)-sputtered films are already crystalline (pure anatase) as-deposited on unheated substrates. Above a thickness of 100 nm, the crystallite size, as deduced from the half-width of X-ray diffraction (XRD) peaks, is constant at 35 nm and decreases to zero when the thickness decreases to 25 nm. Below a thickness of 25 nm, the films are X-ray amorphous. Height and half-width of the XRD peaks of rf-sputtered films do not change upon post-heating at 300 or 500 °C. A larger lattice parameter ratio c/a is observed with respect to the bulk value that decreases with increasing film thickness and is about 1% larger for a film thickness larger than 100 nm.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 558, 2 May 2014, Pages 443–448
نویسندگان
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