کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1665789 1518056 2013 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Antireflective sub-wavelength structures on fused silica via self-assembly of silica
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Antireflective sub-wavelength structures on fused silica via self-assembly of silica
چکیده انگلیسی


• Antireflective structures on fused silica are grown using a self-assembly technique.
• The properties of structures with different etching time were studied.
• The laser-induced damage threshold of glass was enhanced after etching.
• The reflection matches the theoretical simulation using a thin-film multilayer model.

Antireflective sub-wavelength structures with high laser-induced damage threshold on fused silica are fabricated using a self-assembly technique, in which a porous yttrium oxide film is deposited as a mask followed by alkaline etching. By controlling the etching time, several sub-wavelength structures with different height, density and diameter have been made. The best reflectance is less than 2.87% for wavelengths from 300 to 1000 nm after 1.5 h etching. The laser-induced damage threshold of the etched glass measured by a 10 ns Nd:YAG laser at a wavelength of 532 nm was as high as 30 J/cm2 compared to 16 J/cm2 of blank glass. The specular reflectance of structures matches the theoretical simulation using a thin-film multilayer model, and the results reveal that the shape of the structures is similar to the calculated parabolic shape. Achieving antireflective sub-wavelength structures on fused silica paves the way for applications in laser systems.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 548, 2 December 2013, Pages 103–108
نویسندگان
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