کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1666194 1518069 2013 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Pathways toward higher performance CdS/CdTe devices: Te exposure of CdTe surface before ZnTe:Cu/Ti contacting
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Pathways toward higher performance CdS/CdTe devices: Te exposure of CdTe surface before ZnTe:Cu/Ti contacting
چکیده انگلیسی

Many studies of thin-film CdS/CdTe photovoltaic devices have suggested that performance may be improved by reducing recombination due to Te-vacancy (VTe), Te antisite (TeCd), or Te-interstitial (Tei) defects. Although formation of these intrinsic defects is likely influenced by CdTe deposition parameters, it may be also coupled to the formation of beneficial cadmium vacancy (VCd) defects. In this study, we expose the CdTe surface to Te vapor prior to ZnTe:Cu/Ti contact-interface formation with the goal of reducing VTe without significantly reducing VCd. Initial results show that when this modified contact is used on a CdCl2-treated CdS/CdTe device, poorer device performance results. This suggests two things: First, the amount of free-Te available during contact formation (either from chemical etching or CuxTe or ZnTe deposition) may be a more important parameter to device performance than previously appreciated. Second, if processes have been used to reduce the effect of VTe (e.g., oxygen and chlorine additions), adding even a small amount of Te may produce detrimental defects.


► Te exposure of CdS/CdTe back contact reduces device performance.
► Field strength and minority carrier lifetime reduced.
► Calculations suggest formation of Te on Cd antisite defect.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 535, 15 May 2013, Pages 237–240
نویسندگان
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