کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1666496 | 1518079 | 2012 | 4 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Non-heating atomic layer deposition of SiO2 using tris(dimethylamino)silane and plasma-excited water vapor Non-heating atomic layer deposition of SiO2 using tris(dimethylamino)silane and plasma-excited water vapor](/preview/png/1666496.png)
Non-heating atomic layer deposition of SiO2 is developed using tris(dimethylamino)silane (TDMAS) and plasma-excited water vapor. The plasma-excited water is effective in oxidizing the TDMAS-adsorbed SiO2 surface while leaving OH sites on the growing surface at room temperature for further TDMAS adsorption. The growth rate is measured to be 0.075 nm/cycle at room temperature. SiO2 stacking directly on a Ge (100) wafer at room temperature is demonstrated, where an atomically flat interface is confirmed by transmission electron microscope observation.
► SiO2 non-heating atomic layer deposition is developed using tris(dimethylamino)silane.
► The oxidizing agent is plasma-excited water vapor.
► The growth rate is measured to be 0.075 nm/cycle at room temperature.
► SiO2 stacking on a Ge (100) wafer with an atomically flat interface is demonstrated.
Journal: Thin Solid Films - Volume 525, 15 December 2012, Pages 73–76