Crack-free yttria stabilized zirconia thin films by aerosol assisted chemical vapor deposition: Influence of water and carrier gas

► Thin film deposition by aerosol assisted chemical vapor deposition (AA-CVD) ► Yttria stabilized zirconia (YSZ) thin films deposited between 300 °C and 600 °C ► Water decreases growth rates and leads to crack formation in AA-CVD of YSZ. ► Crack-free YSZ thin films deposited using oxygen and/or nitrogen as carrier gas ► YSZ thin films deposited by AA-CVD show low shrinkage on annealing at 1000 °C.