A two step process to form organothiol self-assembled monolayers on nickel surfaces

This paper reports on an original and simple two step process of nickel oxide layer reduction and rapid self-assembling of n-dodecanethiol on nickel surfaces. Chemical reduction of the oxide layer present on polycrystalline nickel surface using hydrazine monohydrate in alkaline media is very fast and facilitates the formation of a dense self-assembled monolayer of thiol from its ethanol solution within six hours. The developed method is simple and the resulting monolayer prevents the nickel surface oxidation when exposed to atmospheric conditions.

► A two step process was developed to form n-dodecanethiol monolayers on nickel.
► Nickel oxide layer was reduced using alkaline hydrazine monohydrate solution.
► n-Dodecanethiol monolayer was formed in six hours on chemically reduced nickel.
► The applied treatment prevents nickel oxide layer formation.
► Electrochemical results are consistent with the presence of nickel sulfide adlayer.