Mesoporous surfaces by phase separation of Al–Si thin films

Phase separated Al–Si films were deposited by simultaneous filtered cathodic vacuum arc (FCVAD) and magnetron sputter deposition. The deposited films were etched to remove the nanocolumns of Al to produce a Si mesoporous structure. The pore size ranged from 3 nm to 6 nm with narrow distribution in size. The pore separation ranged from 6.5 nm to 11.5 nm. The results are interpreted using a model to describe the pore size as a function of the depositing particle impingement energy.

► Al-Si phase separated films have been synthesized using simultaneous filtered cathodic vacuum arc and magnetron sputtering deposition.
► Pores sizes of the etched films were 3 nm to 6 nm with a narrow size distribution.
► Results are interpreted using a model based on impingement energy of Al ions.